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一种新型SOI结构——SiGe-OI材料研究进展

A new SOI structure——SiGe-OI

  • 摘要: SOI(silicon on insulator,绝缘层上的硅)技术和SiGe(silicon germanium,锗硅)技术都是微电子领域的前沿技术.SiGe-OI(SiGe-on-insulator,绝缘层上的锗硅)新型材料是最近几年来才出现的一种新型SOI材料,它同时具备了SOI技术和SiGe技术的优势,因而成为当前微电子研究领域的最前沿课题之一.文章结合中国科学院上海微系统与信息技术研究所的工作,综述了SiGe-OI材料研究情况和应用前景,详细介绍了其主要的制备方法,最后报道了作者在SiGe-OI材料研究上的一些实验结果.

     

    Abstract: Silicon on insulator(SOI) and SiGe are both promising materials to the microelectronics including due to their potential in low voltage, low power, high speed applications and compatibility with mature Si technology. A new SOI structure, SiGe-OI, which appeared recently integrates the advantages of both SOI and SiGe, and has become one of the new frontiers in the microelectronics field. We review the resent research on SiGe-OI, its applications and fabrication, including some results of our own work.

     

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